Structural behavior of rf magnetron sputtered cupric oxide (CuO) films

  • Ali Khilkhal Mr.
  • Abdalhussain A. Khadayeir
DOI: https://doi.org/10.29350/qjps.2020.25.2.1082
Keywords: Cupric Oxide, RF Magnetron Sputtering, Thin films

Abstract

In this paper a CuO thin film, has been deposited using RF sputtering technique, then the thin film has been characterized by XRD, result obtained showed that strongest peak was 48.6503 degree, and FWHM was 0.145 degree, while lattice constant was 4.65 Aº, and the average grain size was 62.78 nm. While AFM analysis showed that the increasing of another four samples temperature led to increase of roughness average from (3.77 to 15.7) nm, root mean square from (4.66 to 18.8) nm and ten points height from (22.6 to 52.6) at 250,300,350 and 400 C respectively. On the other hand granularity cumulation distribution charts showed average diameter has varied from (57.42, to 135.41) nm with grain numbers per line ( 364, to 135) respectively.

Downloads

Download data is not yet available.
Published
2020-04-05
How to Cite
Khilkhal, A., & A. Khadayeir, A. (2020). Structural behavior of rf magnetron sputtered cupric oxide (CuO) films. Al-Qadisiyah Journal of Pure Science, 25(2), Phys 1-7. https://doi.org/10.29350/qjps.2020.25.2.1082
Issue
Vol 25 No 2 (2020)
Section
Physics

Copyright © Author(s) . This is an open access article distributed under the Creative Commons Attribution
License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly
cited.